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141

Yield Management Enhanced Advanced Process Control System (YMeAPC)—Part I: Description and Case Study of Feedback for Optimized Multiprocess Control : Advanced process control
MOYNE, James ; SCHULZE, Brad
IEEE transactions on semiconductor manufacturing. 23(2):221-235

Electronics Electronique Sciences exactes et tech... Exact sciences and techn... Sciences appliquees Applied sciences
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143

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145

Model-based advanced process control of coagulation
BAXTER, C. W ; SHARIFF, R ; STANLEY, S. J ; et al.
ICA 2001 : instrumentation, control and automation 2001 (Malmö, 3-7 June 2001)Water science and technology. :9-17

Civil engineering Génie civil Geology Géologie Pollution Sciences exactes et tech...
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146

Model Validation and Real-Time Process Control of a Continuous Flow Ohmic Heater
Oluwaloba Oluwole-ojo ; Tasmiyah Javed ; Martin Howarth ; et al.
Modelling, Vol 5, Iss 3, Pp 752-775 (2024)

model validation Engineering design 0404 agricultural biotec... TA174 advanced process control 04 agricultural and vete...
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147

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148

Development and deployment of a multi-component advanced process control system for an epitaxy tool
MOYNE, James ; SOLAKHIAN, Victor ; YERSHOV, Alexander ; et al.
ASMC 2002 : advancing the science and technology of semiconductor manufacturing (Boston MA, 30 April - 2 May 2002)ASMC proceedings. :125-130

Electronics Electronique Sciences exactes et tech... Exact sciences and techn... Sciences appliquees Applied sciences
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149

Perspective Chapter: Advanced Process Control and Automation with Special Focus on Emerging Continuous Bioprocessing
Letha Chemmalil ; Chris Chumsae ; Gloria Li ; et al.
Biochemistry ISBN: 9781837682911

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150

Large-Scale Semiconductor Process Fault Detection Using a Fast Pattern Recognition-Based Method : Advanced process control
QINGHUA PETER HE ; JIN WANG
IEEE transactions on semiconductor manufacturing. 23(2):194-200

Electronics Electronique Sciences exactes et tech... Exact sciences and techn... Sciences appliquees Applied sciences
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151

A comprehensive review on Advanced Process Control of cement kiln process with the focus on MPC tuning strategies
Ramasamy, Valarmathi ; Kannan, Ramkumar ; Muralidharan, Guruprasath ; et al.
In Journal of Process Control January 2023 121:85-102

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152

Addressing Dynamic Process Changes in High Volume Plasma Etch Manufacturing by Using Multivariate Process Control : Advanced process control
PARKINSON, Blake R ; HYUNG LEE ; FUNK, Merritt ; et al.
IEEE transactions on semiconductor manufacturing. 23(2):185-193

Electronics Electronique Sciences exactes et tech... Exact sciences and techn... Sciences appliquees Applied sciences
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153

Advanced process control in laser-based powder bed fusion–Smart Fusion feedback-loop control as a path to uniform properties for complex structures?
Nahr, Florian ; Novotny, Tobias ; Kunz, Dominik ; et al.
Journal of Materials Research and Technology ; volume 34, page 604-618 ; ISSN 2238-7854

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154

Performance Assessments of an Advanced Control System in an Iron Ore Industrial Grinding Circuit.
Costa, Pamela Karem ; Vaz, Patricia Nogueira ; Calixto, Marcelo Ferreira ; et al.
Minerals (2075-163X). Nov2025, Vol. 15 Issue 11, p1172. 18p.

PROCESS control systems IRON ores ENERGY consumption DYNAMIC stability ECONOMIC efficiency PROCESS optimization
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155

TEOS Integrated High-Low Pressure RPS Clean: APC: Advanced Process Control
Tan Hong Kai ; Kenneth Mah Chih Yuang ; Chiam Chek Chou ; et al.
2024 35th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC). :1-3

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156

Advanced Process Control System description of an easy-to-use control system incorporating pluggable modules
FUKUDA, E ; HARAKAWA, S ; IKEDA, M
ISSM '99 : International symposium on semiconductor manufacturing conference (Santa Clara CA, 11-13 october 1999). :321-324

Electronics Electronique Sciences exactes et tech... Exact sciences and techn... Sciences appliquees Applied sciences
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157
158

Decision-based virtual metrology for advanced process control to empower smart production and an empirical study for semiconductor manufacturing.
Chen-Fu Chien 0001 ; Wei-Tse Hung ; Chin-Wei Pan ; et al.
Comput. Ind. Eng.. 169:108245-108245

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160

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