Chien, C.-F., Hung, W.-T., Pan, C.-W., & Van Nguyen, T. H. (2022). Decision-based virtual metrology for advanced process control to empower smart production and an empirical study for semiconductor manufacturing. Computers & Industrial Engineering, 169, N.PAG-0. https://doi.org/10.1016/j.cie.2022.108245
ISO-690 (author-date, English)CHIEN, Chen-Fu, HUNG, Wei-Tse, PAN, Chin-Wei und VAN NGUYEN, Tran Hong, 2022. Decision-based virtual metrology for advanced process control to empower smart production and an empirical study for semiconductor manufacturing. Computers & Industrial Engineering. 1 Juli 2022. Vol. 169, , p. N.PAG-0. DOI 10.1016/j.cie.2022.108245.
Modern Language Association 9th editionChien, C.-F., W.-T. Hung, C.-W. Pan, und T. H. Van Nguyen. „Decision-Based Virtual Metrology for Advanced Process Control to Empower Smart Production and an Empirical Study for Semiconductor Manufacturing.“. Computers & Industrial Engineering, Bd. 169, Juli 2022, S. N.PAG-0, https://doi.org/10.1016/j.cie.2022.108245.
Mohr Siebeck - Recht (Deutsch - Österreich)Chien, Chen-Fu/Hung, Wei-Tse/Pan, Chin-Wei/Van Nguyen, Tran Hong: Decision-based virtual metrology for advanced process control to empower smart production and an empirical study for semiconductor manufacturing., Computers & Industrial Engineering 2022, N.PAG-0.
Emerald - HarvardChien, C.-F., Hung, W.-T., Pan, C.-W. und Van Nguyen, T.H. (2022), „Decision-based virtual metrology for advanced process control to empower smart production and an empirical study for semiconductor manufacturing.“, Computers & Industrial Engineering, Vol. 169, S. N.PAG-0.