Serviceeinschränkungen vom 12.-22.02.2026 - weitere Infos auf der UB-Homepage
American Psychological Association 6th edition

Kao, C.-A., Cheng, F.-T., Wu, W.-M., Kong, F.-W., & Huang, H.-H. (2013). Run-to-Run Control Utilizing Virtual Metrology With Reliance Index. IEEE Transactions on Semiconductor Manufacturing, 26(1), 69-81. https://doi.org/10.1109/TSM.2012.2228243

ISO-690 (author-date, English)

KAO, Chi-An, CHENG, Fan-Tien, WU, Wei-Ming, KONG, Fan-Wei und HUANG, Hsuan-Heng, 2013. Run-to-Run Control Utilizing Virtual Metrology With Reliance Index. IEEE Transactions on Semiconductor Manufacturing. 1 Februar 2013. Vol. 26, no. 1, p. 69-81. DOI 10.1109/TSM.2012.2228243.

Modern Language Association 9th edition

Kao, C.-A., F.-T. Cheng, W.-M. Wu, F.-W. Kong, und H.-H. Huang. „Run-to-Run Control Utilizing Virtual Metrology With Reliance Index.“. IEEE Transactions on Semiconductor Manufacturing, Bd. 26, Nr. 1, Februar 2013, S. 69-81, https://doi.org/10.1109/TSM.2012.2228243.

Mohr Siebeck - Recht (Deutsch - Österreich)

Kao, Chi-An/Cheng, Fan-Tien/Wu, Wei-Ming/Kong, Fan-Wei/Huang, Hsuan-Heng: Run-to-Run Control Utilizing Virtual Metrology With Reliance Index., IEEE Transactions on Semiconductor Manufacturing 2013, 69-81.

Emerald - Harvard

Kao, C.-A., Cheng, F.-T., Wu, W.-M., Kong, F.-W. und Huang, H.-H. (2013), „Run-to-Run Control Utilizing Virtual Metrology With Reliance Index.“, IEEE Transactions on Semiconductor Manufacturing, Vol. 26 No. 1, S. 69-81.

Achtung: Diese Zitate sind unter Umständen nicht zu 100% korrekt.