Treffer: Exploring structural mechanisms in disordered materials using the activation-relaxation technique

Title:
Exploring structural mechanisms in disordered materials using the activation-relaxation technique
Source:
Proceedings of the Europhysics Conference on Computational Physics CCP 1998 Modeling Collective Phenomena in Complex SystemsComputer physics communications. 121-22:206-209
Publisher Information:
Amsterdam: Elsevier Science, 1999.
Publication Year:
1999
Physical Description:
print, 10 ref
Original Material:
INIST-CNRS
Document Type:
Konferenz Conference Paper
File Description:
text
Language:
English
Author Affiliations:
Theoretical Physics, Utrecht University, Princetonplein 5, 3584 CC Utrecht, Netherlands
Department of Physics and Astronomy, Ohio University, Athens, OH 45701, United States
ISSN:
0010-4655
Rights:
Copyright 2000 INIST-CNRS
CC BY 4.0
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
Notes:
Metrology

Physics of condensed state: structure, mechanical and thermal properties
Accession Number:
edscal.1228048
Database:
PASCAL Archive

Weitere Informationen

Structural mechanisms in disordered materials like amorphous semi-conductors and glasses can be explored with the activation-relaxation technique (ART). The application of a sequence of such mechanisms allows for the generation of well-relaxed structures. The method and its application in the study of the microscopic changes in amorphous silicon and silica glass are reviewed, and two recent improvements are presented.