Result: Low frictional property of copper oxide thin films optimised using a combinatorial sputter coating system
Title:
Low frictional property of copper oxide thin films optimised using a combinatorial sputter coating system
Authors:
Source:
CMST-3: proceedings of the third Japan-US workshop on combinatorial material science and technology, Okinawa, Japan, 7-10 December, 2004Applied surface science. 252(7):2482-2487
Publisher Information:
Amsterdam: Elsevier Science, 2006.
Publication Year:
2006
Physical Description:
print, 9 ref
Original Material:
INIST-CNRS
Subject Terms:
General chemistry, physical chemistry, Chimie générale, chimie physique, Crystallography, Cristallographie cristallogenèse, Nanotechnologies, nanostructures, nanoobjects, Nanotechnologies, nanostructures, nanoobjets, Condensed state physics, Physique de l'état condensé, Sciences exactes et technologie, Exact sciences and technology, Physique, Physics, Domaines interdisciplinaires: science des materiaux; rheologie, Cross-disciplinary physics: materials science; rheology, Science des matériaux, Materials science, Méthodes de dépôt de films et de revêtements; croissance de films et épitaxie, Methods of deposition of films and coatings; film growth and epitaxy, Depôt par pulvérisation cathodique, Deposition by sputtering, Composé minéral, Inorganic compounds, Métal transition composé, Transition element compounds, Coefficient frottement, Friction factor, Couche mince, Thin films, Cuivre oxyde, Copper oxides, Diffraction RX, XRD, Méthode combinatoire, Combinatorial method, Método combinatorio, Orientation cristalline, Crystal orientation, Orientation préférentielle, Preferred orientation, Orientación preferencial, Pression partielle, Partial pressure, Revêtement pulvérisation, Sputtered coatings, Cu O, CuO, Coating, Combinatorial sputter coating: Frictional property, Copper oxide, Preferred crystal orientation
Document Type:
Conference
Conference Paper
File Description:
text
Language:
English
Author Affiliations:
Materials Engineering Laboratory, National Institute for Materials Science. 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan
ISSN:
0169-4332
Rights:
Copyright 2006 INIST-CNRS
CC BY 4.0
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
CC BY 4.0
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
Notes:
Physics and materials science
Accession Number:
edscal.17567799
Database:
PASCAL Archive
Further Information
A combinatorial sputter coating system has been developed that can optimize the crystal preferred orientation of coating films. With this system, it is possible to synthesize various kinds of coatings whilst precisely controlling conditions such as the sputter gas, the gas pressure, the gas partial pressure, the r.f. power, the substrate temperature, the distance between the substrate and target, etc. In this way, we successfully synthesized copper oxide coatings with different crystal preferred orientations, and low frictional property was obtained by optimizing the crystal preferred orientation.