Treffer: Tools to measure CD-SEM performance
Title:
Tools to measure CD-SEM performance
Authors:
Source:
Metrology, inspection, and process control for microlithography XX (20-23 February 2006, San Jose, California, USA)Proceedings of SPIE, the International Society for Optical Engineering.
Publisher Information:
Bellingham (Wash.): SPIE, 2006.
Publication Year:
2006
Physical Description:
print, 11 ref 2
Original Material:
INIST-CNRS
Subject Terms:
Electronics, Electronique, Metrology and instrumentation, Métrologie et instrumentation, Optics, Optique, Physics, Physique, Sciences exactes et technologie, Exact sciences and technology, Physique, Physics, Generalites, General, Instruments, appareillage, composants et techniques communs à plusieurs branches de la physique et de l'astronomie, Instruments, apparatus, components and techniques common to several branches of physics and astronomy, Microscopes à champ proche, composants et techniques, Scanning probe microscopes, components and techniques, Sciences appliquees, Applied sciences, Electronique, Electronics, Electronique des semiconducteurs. Microélectronique. Optoélectronique. Dispositifs à l'état solide, Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices, Circuits intégrés, Integrated circuits, Conception. Technologies. Analyse fonctionnement. Essais, Design. Technologies. Operation analysis. Testing, Analyse Fourier, Fourier analysis, Análisis Fourier, Analyse image, Image analysis, Análisis imagen, Ecriture faisceau électronique, Electron beam writing, Escritura haz electrónico, Evaluation performance, Performance evaluation, Evaluación prestación, Formation image, Imaging, Formación imagen, Langage JAVA, JAVA language, Lenguaje JAVA, Logiciel, Software, Logicial, Microscopie électronique balayage, Scanning electron microscopy, Microscopía electrónica barrido, Packaging électronique, Electronic packaging, Packaging electrónico, Réseau zoné, Zone plate, Red zonada, Taille critique, Critical size, Transformation Fourier, Fourier transformation, Transformación Fourier, Zone Fresnel, Fresnel zone, Zona Fresnel
Time:
0779
Document Type:
Konferenz
Conference Paper
File Description:
text
Language:
English
Author Affiliations:
University of Tennessee, Electron Beam Laboratory, Knoxville, TN 37996-0840, United States
Dept. of Elect, and Computer Eng., Auburn University, Auburn, AL 36849, United States
Oak Ridge National Laboratory, Oak Ridge, TN 3731, United States
Dept. of Elect, and Computer Eng., Auburn University, Auburn, AL 36849, United States
Oak Ridge National Laboratory, Oak Ridge, TN 3731, United States
ISSN:
0277-786X
Rights:
Copyright 2006 INIST-CNRS
CC BY 4.0
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
CC BY 4.0
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
Notes:
Electronics
Metrology
Metrology
Accession Number:
edscal.18243955
Database:
PASCAL Archive
Weitere Informationen
It is important to be able to quantify the imaging performance of CD-SEMs for such purposes as verifying the specification, rechecking after a routine maintenance, or for tool matching. To perform tests such as these it is necessary to have both appropriate software for image analysis and suitable test samples. A package of 2-D Fourier transform and analysis software, designed as a plug-in for the shareware IMAGE-Java program, has been developed and is freely available on line. The requirement for a reproducible and well characterized sample has been met by using direct-write electron beam lithography to fabricate a suitable Fresnel zone plate structures.