Result: The optical properties of monolayer amorphous Al2O3-TiO2 composite films used as HT-APSM blanks for ArF immersion lithography

Title:
The optical properties of monolayer amorphous Al2O3-TiO2 composite films used as HT-APSM blanks for ArF immersion lithography
Authors:
LAI, Fu-Der, HUANG, C. Y, KO, Fu-Hsiang
Source:
Proceedings of the 32nd International Conference on Micro- and Nano-Engineering, Barcelona, 17-20 September 2006Microelectronic engineering. 84(5-8):716-720
Publisher Information:
Amsterdam: Elsevier Science, 2007.
Publication Year:
2007
Physical Description:
print, 6 ref
Original Material:
INIST-CNRS
Subject Terms:
Electronics, Electronique, Sciences exactes et technologie, Exact sciences and technology, Sciences appliquees, Applied sciences, Electronique, Electronics, Electronique des semiconducteurs. Microélectronique. Optoélectronique. Dispositifs à l'état solide, Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices, Fabrication microélectronique (technologie des matériaux et des surfaces), Microelectronic fabrication (materials and surfaces technology), Caractéristique optique, Optical characteristic, Característica óptica, Constante optique, Optical constant, Constante óptica, Couche mince, Thin film, Capa fina, Déphasage, Phase shift, Defasaje, Fabrication microélectronique, Microelectronic fabrication, Fabricación microeléctrica, Facteur transmission, Transmittance, Factor transmisión, Lithographie, Lithography, Litografía, Masque déphasage, Phase shifting masks, Matériau amorphe, Amorphous material, Material amorfo, Matériau composite, Composite material, Material compuesto, Méthode immersion, Immersion method, Método immersión, Photolithographie, Photolithography, Fotolitografía, Pulvérisation cathodique, Cathodic sputtering, Pulverización catódica, Température ambiante, Room temperature, Temperatura ambiente, ArF immersion lithography, Composite film, High transmittance attenuated phase shift mask, Optical property
Document Type:
Conference Conference Paper
File Description:
text
Language:
English
Author Affiliations:
Institute of Electro-Optical Engineering, National Kaohsiung First University of Science and Technology, Kaohsiung 811, Tawain, Province of China
Department of Materials Engineering, Tatung University, Taipei 104, Tawain, Province of China
Institute of Nanotechnology, National Chiao Tung University, Hsinchu 300, Tawain, Province of China
ISSN:
0167-9317
Access URL:
http://pascal-francis.inist.fr/vibad/index.php?action=search&terms=18807296
Rights:
Copyright 2007 INIST-CNRS
CC BY 4.0
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
Notes:
Electronics
Accession Number:
edscal.18807296
Database:
PASCAL Archive

Further Information

Amorphous (Al2O3)x(TiO2)1-x composite films are prepared using r.f. unbalanced magnetron sputtering in an atmosphere of argon and oxygen at room temperature. The optical constants of (Al2O3)x-(TiO2)1-x composite films are linearly dependent on the Al2O3 mole fraction in the Al2O3-TiO2composite film. The optical constants of these Al2O3-TiO2 composite films can be made to meet the optical requirements for a high transmittance attenuated phase shift mask (HT-APSM) blank by tuning the Al2O3 mole fraction. The Al2O3 mole fraction range that would allow the films to meet the optical requirements of an HT-APSM blank for ArF immersion lithography is calculated to be between 76% and 84%. One n-phase-shifted Al2O3-TiO2 composite thin film to be used as an HT-APSM blank for ArF immersion lithography is fabricated and is shown to satisfy the optical requirements.