Treffer: The UV-nanoimprint lithography equipment with multi-head imprinting unit for sub-50 nm half-pitch patterns

Title:
The UV-nanoimprint lithography equipment with multi-head imprinting unit for sub-50 nm half-pitch patterns
Authors:
LEE, Jaejong, CHOI, Keebong, KIM, Geehong, LEE, Seungwoo
Source:
Proceedings of the 32nd International Conference on Micro- and Nano-Engineering, Barcelona, 17-20 September 2006Microelectronic engineering. 84(5-8):963-966
Publisher Information:
Amsterdam: Elsevier Science, 2007.
Publication Year:
2007
Physical Description:
print, 5 ref
Original Material:
INIST-CNRS
Subject Terms:
Electronics, Electronique, Sciences exactes et technologie, Exact sciences and technology, Sciences appliquees, Applied sciences, Electronique, Electronics, Electronique des semiconducteurs. Microélectronique. Optoélectronique. Dispositifs à l'état solide, Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices, Circuits intégrés, Integrated circuits, Conception. Technologies. Analyse fonctionnement. Essais, Design. Technologies. Operation analysis. Testing, Fabrication microélectronique (technologie des matériaux et des surfaces), Microelectronic fabrication (materials and surfaces technology), Diminution coût, Cost lowering, Reducción costes, Fabrication microélectronique, Microelectronic fabrication, Fabricación microeléctrica, Lithographie UV, UV lithography, Litografía UV, Module multipuce, Multichip module, Modulo multipulga, Nanolithographie, Nanolithography, Photolithographie, Photolithography, Fotolitografía, Réplication, Replication, Replicación, Structure flexible, Flexible structure, Estructura flexible, Nanoimprinting lithography, Nanoimprinting; Multi-head unit; Overlay and alignment; Compliant mechanism
Document Type:
Konferenz Conference Paper
File Description:
text
Language:
English
Author Affiliations:
Korea Institute of Machinery and Materials, 171 Jang-dong, Yusung-ku, DaeJeon 305-600, Korea, Republic of
ISSN:
0167-9317
Access URL:
http://pascal-francis.inist.fr/vibad/index.php?action=search&terms=18807353
Rights:
Copyright 2007 INIST-CNRS
CC BY 4.0
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
Notes:
Electronics
Accession Number:
edscal.18807353
Database:
PASCAL Archive

Weitere Informationen

Nanoimprinting lithography (NIL) is a promising technology to produce sub-50 nm half-pitch features on silicon- and/or quartz-based substrates. It is well-known as the next generation lithography. Especially, the UV-nanoimprint lithography technology has advantages of the simple process, low cost, high replication fidelity and relatively high throughput. In this paper, chip-size multi-head imprinting unit with compliance stage and overlay/alignment system with moiré and dual grating unit are proposed in order to fabricate sub-50 nm half-pitch patterns. These systems are set-up and performed in single-step nanoimprinting tool (ANT-4) which has several functional units for nanoimprinting process. Using the UV-NIL tool, 50 nm, 70 nm and 100 nm half-pitch dot and line patterns are obtained. Also, 20 nm overlay/alignment accuracy is obtained by means of the proposed method.