Treffer: The role of MEMS in maskless lithography
Title:
The role of MEMS in maskless lithography
Authors:
Source:
Proceedings of the 32nd International Conference on Micro- and Nano-Engineering, Barcelona, 17-20 September 2006Microelectronic engineering. 84(5-8):1027-1032
Publisher Information:
Amsterdam: Elsevier Science, 2007.
Publication Year:
2007
Physical Description:
print, 31 ref
Original Material:
INIST-CNRS
Subject Terms:
Electronics, Electronique, Sciences exactes et technologie, Exact sciences and technology, Sciences appliquees, Applied sciences, Electronique, Electronics, Electronique des semiconducteurs. Microélectronique. Optoélectronique. Dispositifs à l'état solide, Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices, Fabrication microélectronique (technologie des matériaux et des surfaces), Microelectronic fabrication (materials and surfaces technology), Dispositifs micro- et nanoélectromécaniques (mems/nems), Micro- and nanoelectromechanical devices (mems/nems), Dispositif microélectromécanique, Microelectromechanical device, Dispositivo microelectromecánico, Fabrication microélectronique, Microelectronic fabrication, Fabricación microeléctrica, Faisceau électronique, Electron beam, Haz electrónico, Lithographie faisceau électron, Electron beam lithography, Litografía haz electrón, Masque, Mask, Máscara, Micromachine, Micromáquina, Microscopie force atomique, Atomic force microscopy, Microscopía fuerza atómica, Optique électronique, Electron optics, Optica electrónica, Parallélisme massif, Massive parallelism, Paralelismo masivo, Pastille électronique, Wafer, Pastilla electrónica, Photolithographie, Photolithography, Fotolitografía, Lithographie sans masque, Maskless lithography, Litografía sin máscara, Lithography masks, MEMS, Multibeam lithography, Semiconductor processing
Document Type:
Konferenz
Conference Paper
File Description:
text
Language:
English
Author Affiliations:
Delft University of Technology, Lorentzweg 1, 2628CJ Delft, Netherlands
ISSN:
0167-9317
Rights:
Copyright 2007 INIST-CNRS
CC BY 4.0
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
CC BY 4.0
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
Notes:
Electronics
Accession Number:
edscal.18807368
Database:
PASCAL Archive
Weitere Informationen
The challenges for maskless lithography at several wafers per hour at the 45-32 nm lithography node are analyzed. The conclusion is that such speed is only obtainable with systems based on massive parallelism, whether the principle is based on light optics, electron optics or atomic force microscopes. The construction of such systems demands the use of micro-electro-mechanical systems (MEMS). Different concepts employing MEMS are reviewed. Typical requirements for the manufacturing of the MEMS components are analyzed for a multi-column electron beam concept such as the MAPPER system. Examples of successfully fabricated array structures are shown.