Result: YBa2Cu3O7-δ formation by processing of laser-ablated, fluorine-free precursor films
Functional Heterostructures Group in Materials Science and Technology Division of Oak Ridge National Lab, Oak Ridge, TN 37831, United States
Electron Microscopy Group in Materials Science and Technology Division of Oak Ridge National Lab, Oak Ridge, TN 37831, United States
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Further Information
Epitaxial YBa2Cu3Ο7-δ(YBCO) was formed by processing of laser-ablated, fluorine-free precursor films. The depositions were conducted at room temperature in low oxygen pressure on LaAlΟ3 (LAO) single crystal substrates. Processing was done in the same deposition chamber by heating the precursor film to reaction temperatures of 750-850° C in a reducing gas ambient, and then raising the oxygen pressure to the conversion point. Typical processing times are a few minutes, corresponding to minimum YBCO growth rates of 1 nm/s. XRD analysis shows epitaxial growth and high crystallinity, although measured Tc values are somewhat suppressed at 88 K, with resulting critical current density, Jc of about 1 MA/cm2 at 77 K, as determined by magnetic hysteresis. Properties indicate that the materials lack appropriate level of defects needed both for rapid oxygenation and flux pinning.