Result: Influence of dual Ge/C pre-amorphization implantation on the Ni1−xPtxSi phase nucleation and growth mechanisms
Title:
Influence of dual Ge/C pre-amorphization implantation on the Ni1−xPtxSi phase nucleation and growth mechanisms
Authors:
Source:
In Microelectronic Engineering 1 May 2021 244-246
Database:
ScienceDirect