Treffer: Numerical modeling and experimental verification of modified-PVT crystal growth of SiC

Title:
Numerical modeling and experimental verification of modified-PVT crystal growth of SiC
Source:
Proceedings of the fifth international workshop on modeling in crystal growth (IWMCG-5), 10-13 september 2006, Bamberg, GermanyJournal of crystal growth. 303(1):337-341
Publisher Information:
Amsterdam: Elsevier, 2007.
Publication Year:
2007
Physical Description:
print, 12 ref
Original Material:
INIST-CNRS
Subject Terms:
Crystallography, Cristallographie cristallogenèse, Geology, Géologie, Metallurgy, welding, Métallurgie, soudage, Sciences exactes et technologie, Exact sciences and technology, Physique, Physics, Domaines interdisciplinaires: science des materiaux; rheologie, Cross-disciplinary physics: materials science; rheology, Science des matériaux, Materials science, Méthodes de croissance cristalline; physique de la croissance cristalline, Methods of crystal growth; physics of crystal growth, Théorie et modèles de la croissance cristalline; physique de la croissance cristalline, morphologie cristalline et orientation cristalline, Theory and models of crystal growth; physics of crystal growth, crystal morphology and orientation, Méthodes de dépôt de films et de revêtements; croissance de films et épitaxie, Methods of deposition of films and coatings; film growth and epitaxy, Depôt par pulvérisation cathodique, Deposition by sputtering, Code informatique, Computer codes, Composition phase, Phase composition, Composición fase, Croissance cristalline, Crystal growth, Diffusion(transport), Diffusion, Dépôt physique phase vapeur, Physical vapor deposition, Etude théorique, Theoretical study, Gallium séléniure, Gallium selenides, Interface croissance, Growth interface, Interfase crecimiento, Masse effective, Effective mass, Modélisation, Modelling, Mécanisme croissance, Growth mechanism, Mecanismo crecimiento, Phase gazeuse, Gas phase, Résultat expérimental, Experimental result, Resultado experimental, Silicium carbure, Silicon carbides, Simulation ordinateur, Computerized simulation, 8110A, 8115C, Ga Se, GaSe, Si, SiC, 81.05.Hd, 81.10.Bk, A1. Numerical modeling, A2. Crystal growth, A2. M-PVT, B1. SiC
Time:
8110
Document Type:
Konferenz Conference Paper
File Description:
text
Language:
English
Author Affiliations:
Department of Materials Science 6, University of Erlangen, Martensstr. 7, 91058 Erlangen, Germany
INP-Grenoble-CNRS, Domaine Universitaire, BP 75, 38402 Saint Martin d'Hères, France
ISSN:
0022-0248
Rights:
Copyright 2007 INIST-CNRS
CC BY 4.0
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
Notes:
Physics and materials science
Accession Number:
edscal.18725629
Database:
PASCAL Archive

Weitere Informationen

This work focuses on numerical modeling of temperature field and mass transport in a so-called modified physical vapor transport (M-PVT) growth configuration, which is a further development of the state-of-the-art SiC bulk crystal growth technique. Modeling has been carried out by adapting the commercial computer code CFD-ACE + (CFD Research Corporation) to the special application. In particular, linked to experimental results in the own lab, we will first show that modeling may be applied to numerically reproduce the impact of an additional gas inlet on the resulting effective mass transport inside the growth setup. In a second step, we will use modeling to understand the physical and chemical processes during crystal growth. We will show how additional gases may be used to tailor the gas phase composition, i.e. C/Si ratio, in front of the SiC growth interface.