Treffer: The use of automatic demolding in nanoimprint lithography processes
Title:
The use of automatic demolding in nanoimprint lithography processes
Authors:
Source:
Proceedings of the 32nd International Conference on Micro- and Nano-Engineering, Barcelona, 17-20 September 2006Microelectronic engineering. 84(5-8):958-962
Publisher Information:
Amsterdam: Elsevier Science, 2007.
Publication Year:
2007
Physical Description:
print, 7 ref
Original Material:
INIST-CNRS
Subject Terms:
Electronics, Electronique, Sciences exactes et technologie, Exact sciences and technology, Sciences appliquees, Applied sciences, Electronique, Electronics, Electronique des semiconducteurs. Microélectronique. Optoélectronique. Dispositifs à l'état solide, Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices, Fabrication microélectronique (technologie des matériaux et des surfaces), Microelectronic fabrication (materials and surfaces technology), Etude comparative, Comparative study, Estudio comparativo, Fabrication microélectronique, Microelectronic fabrication, Fabricación microeléctrica, Nanolithographie, Nanolithography, Polymère, Polymer, Polímero, Thermoplastique, Thermoplastics, Termoplástica, Demolding, Molecular weight, Nanoimprint lithography, Thermoplastic
Document Type:
Konferenz
Conference Paper
File Description:
text
Language:
English
Author Affiliations:
Fundación Tekniker, Avda. Otaola, 20, 20600 Eibar, Guipuzkoa, Spain
Laboratory for Micro and Nanotechnology, Paul Scherrer Institute, 5232 Villigen, Switzerland
VTT Micro and Nanoelectronics, Tietotie 3, Espoo, 02044, Finland
Laboratory for Micro and Nanotechnology, Paul Scherrer Institute, 5232 Villigen, Switzerland
VTT Micro and Nanoelectronics, Tietotie 3, Espoo, 02044, Finland
ISSN:
0167-9317
Rights:
Copyright 2007 INIST-CNRS
CC BY 4.0
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
CC BY 4.0
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
Notes:
Electronics
Accession Number:
edscal.18807352
Database:
PASCAL Archive
Weitere Informationen
Three different setups for automatic demolding in nanoimprint, including air induced demolding and fast and slow demolding, are studied for different stamps designs, and compared with standard manual demolding. A comparison between the setups shows differences in quality between polymers of different molecular weight, and of different grating periods.