American Psychological Association 6th edition

MERINO, S., SCHIFT, H., RETOLAZA, A., & HAATAINEN, T. (2007, January 1). The use of automatic demolding in nanoimprint lithography processes. 84(5-8). Amsterdam: Elsevier Science, 2007. Retrieved from http://pascal-francis.inist.fr/vibad ndex.php?action=search&terms=18807352

ISO-690 (author-date, English)

MERINO, S, SCHIFT, H, RETOLAZA, A and HAATAINEN, T, 2007. The use of automatic demolding in nanoimprint lithography processes. In: [online]. Amsterdam: Elsevier Science, 2007. 1 January 2007. Available from: http://pascal-francis.inist.fr/vibad ndex.php?action=search&terms=18807352

Modern Language Association 9th edition

MERINO, S., H. SCHIFT, A. RETOLAZA, and T. HAATAINEN. The use of automatic demolding in nanoimprint lithography processes. no. 5-8, Amsterdam: Elsevier Science, 2007., 2007, http://pascal-francis.inist.fr/vibad ndex.php?action=search&terms=18807352.

Mohr Siebeck - Recht (Deutsch - Österreich)

Emerald - Harvard

MERINO, S., SCHIFT, H., RETOLAZA, A. and HAATAINEN, T. (2007), “The use of automatic demolding in nanoimprint lithography processes”, in , Vol. 84, Amsterdam: Elsevier Science, 2007., available at: http://pascal-francis.inist.fr/vibad ndex.php?action=search&terms=18807352.

Warning: These citations may not always be 100% accurate.