Treffer: Value-added metrology

Title:
Value-added metrology
Source:
IEEE transactions on semiconductor manufacturing. 20(3):266-277
Publisher Information:
New York, NY: Institute of Electrical and Electronics Engineers, 2007.
Publication Year:
2007
Physical Description:
print, 14 ref
Original Material:
INIST-CNRS
Document Type:
Konferenz Conference Paper
File Description:
text
Language:
English
Author Affiliations:
International SEMATECH Manufacturing Initiative, Austin, TX 78741, United States
Freescale Semiconductor, Austin, TX 78721, United States
IBM Microelectronics, Hawthorne, NY 12533, United States
SEMATECH, Albany, NY, United States
Advanced Micro Devices, Sunnyvale, CA 94088, United States
Advanced Micro Devices, Austin, TX 78741, United States
ISSN:
0894-6507
Rights:
Copyright 2007 INIST-CNRS
CC BY 4.0
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
Notes:
Electronics
Accession Number:
edscal.18990973
Database:
PASCAL Archive

Weitere Informationen

-The conventional premise, long-touted among the semiconductor processing community, that metrology is a non-value-added necessary evil, is a misleading and dangerous assertion, which must be viewed as obsolete thinking. Many metrology applications are key enablers to traditionally labeled value-added processing steps in lithography and etch, such that they can be considered integral parts of the processes. Various key trends in modern, state-of-the-art processing such as optical proximity correction, design for manufacturability, and advanced process control are based, at their hearts, on the assumption of fine-tuned metrology, in terms of uncertainty and accuracy. These trends are vehicles where metrology thus has large opportunities to create value through the engineering of tight and targetable process distributions. Such distributions make possible predictability in speed-sorts and in other parameters, which results in a high-end product. Additionally, significant reliance has also been placed on defect metrology to predict, improve, and reduce yield variability. The necessary quality metrology is strongly influenced by not only the choice of equipment, but also the quality application of these tools in a production environment. The ultimate value added by metrology is a result of quality tools run by a quality metrology team using quality practices. This paper will explore the relationships among present and future trends and challenges in metrology, including equipment, key applications, and metrology deployment in the manufacturing flow. Of key importance are metrology personnel, with their expertise, practices, and metrics in achieving and maintaining the required level of metrology performance, including where precision, matching, and accuracy fit into these considerations. The value of metrology will be demonstrated to have shifted to being a key enabler of large revenues, debunking the out-of-date premise that metrology is non-value-added.