FUKUMURA, T., OHTANI, M., NISHIMURA, J., KAGEYAMA, T., KOIDA, T., LIPPMAA, M., KAWASAKI, M., HASEGAWA, T., & KOINUMA, H. (2001, January 1). Temperature-gradient and composition-spread deposition of epitaxial oxide films and high throughput characterization. Presented at the. Bellingham WA: SPIE, 2001. Retrieved from http://pascal-francis.inist.fr/vibad ndex.php?action=search&terms=1019972
ISO-690 (author-date, English)FUKUMURA, T, OHTANI, M, NISHIMURA, J, KAGEYAMA, T, KOIDA, T, LIPPMAA, M, KAWASAKI, M, HASEGAWA, T and KOINUMA, H, 2001. Temperature-gradient and composition-spread deposition of epitaxial oxide films and high throughput characterization. In: [online]. Bellingham WA: SPIE, 2001. 1 January 2001. Available from: http://pascal-francis.inist.fr/vibad ndex.php?action=search&terms=1019972
Modern Language Association 9th editionFUKUMURA, T., M. OHTANI, J. NISHIMURA, T. KAGEYAMA, T. KOIDA, M. LIPPMAA, M. KAWASAKI, T. HASEGAWA, and H. KOINUMA. Temperature-gradient and composition-spread deposition of epitaxial oxide films and high throughput characterization. Bellingham WA: SPIE, 2001., 2001, http://pascal-francis.inist.fr/vibad ndex.php?action=search&terms=1019972.
Mohr Siebeck - Recht (Deutsch - Österreich)Emerald - Harvard
FUKUMURA, T., OHTANI, M., NISHIMURA, J., KAGEYAMA, T., KOIDA, T., LIPPMAA, M., KAWASAKI, M., HASEGAWA, T. and KOINUMA, H. (2001), “Temperature-gradient and composition-spread deposition of epitaxial oxide films and high throughput characterization”, in , Vol. , Bellingham WA: SPIE, 2001., available at: http://pascal-francis.inist.fr/vibad ndex.php?action=search&terms=1019972.