KERBER, A., PANTISANO, L., VELOSO, A., GROESENEKEN, G., & KERBER, M. (2007, Januar 1). Reliability screening of high-k dielectrics based on voltage ramp stress. 47(4-5). Oxford: Elsevier, 2007. Abgerufen von http://pascal-francis.inist.fr/vibad ndex.php?action=search&terms=18790324
ISO-690 (author-date, English)KERBER, A, PANTISANO, L, VELOSO, A, GROESENEKEN, G und KERBER, M, 2007. Reliability screening of high-k dielectrics based on voltage ramp stress. In: [online]. Oxford: Elsevier, 2007. 1 Januar 2007. Available from: http://pascal-francis.inist.fr/vibad ndex.php?action=search&terms=18790324
Modern Language Association 9th editionKERBER, A., L. PANTISANO, A. VELOSO, G. GROESENEKEN, und M. KERBER. Reliability screening of high-k dielectrics based on voltage ramp stress. Nr. 4-5, Oxford: Elsevier, 2007., 2007, http://pascal-francis.inist.fr/vibad ndex.php?action=search&terms=18790324.
Mohr Siebeck - Recht (Deutsch - Österreich)Emerald - Harvard
KERBER, A., PANTISANO, L., VELOSO, A., GROESENEKEN, G. und KERBER, M. (2007), „Reliability screening of high-k dielectrics based on voltage ramp stress“, in , Bd. 47, Oxford: Elsevier, 2007., verfügbar unter: http://pascal-francis.inist.fr/vibad ndex.php?action=search&terms=18790324.