BYEON, K.-J., YANG, K.-Y., & LEE, H. (2007, January 1). Thermal imprint lithography using sub-micron sized nickel template coated with thin Si O2 layer. 84(5-8). Amsterdam: Elsevier Science, 2007. Retrieved from http://pascal-francis.inist.fr/vibad ndex.php?action=search&terms=18807362
ISO-690 (author-date, English)BYEON, Kyeong-Jae, YANG, Ki-Yeon and LEE, Heon, 2007. Thermal imprint lithography using sub-micron sized nickel template coated with thin Si O2 layer. In: [online]. Amsterdam: Elsevier Science, 2007. 1 January 2007. Available from: http://pascal-francis.inist.fr/vibad ndex.php?action=search&terms=18807362
Modern Language Association 9th editionBYEON, K.-J., K.-Y. YANG, and H. LEE. Thermal imprint lithography using sub-micron sized nickel template coated with thin Si O2 layer. no. 5-8, Amsterdam: Elsevier Science, 2007., 2007, http://pascal-francis.inist.fr/vibad ndex.php?action=search&terms=18807362.
Mohr Siebeck - Recht (Deutsch - Österreich)Emerald - Harvard
BYEON, K.-J., YANG, K.-Y. and LEE, H. (2007), “Thermal imprint lithography using sub-micron sized nickel template coated with thin Si O2 layer”, in , Vol. 84, Amsterdam: Elsevier Science, 2007., available at: http://pascal-francis.inist.fr/vibad ndex.php?action=search&terms=18807362.