MAPPES, T., ACHENBACH, S., & MOHR, J. (2007, Januar 1). X-ray lithography for devices with high aspect ratio polymer submicron structures. 84(5-8). Amsterdam: Elsevier Science, 2007. Abgerufen von http://pascal-francis.inist.fr/vibad ndex.php?action=search&terms=18807417
ISO-690 (author-date, English)MAPPES, Timo, ACHENBACH, Sven und MOHR, Juergen, 2007. X-ray lithography for devices with high aspect ratio polymer submicron structures. In: [online]. Amsterdam: Elsevier Science, 2007. 1 Januar 2007. Available from: http://pascal-francis.inist.fr/vibad ndex.php?action=search&terms=18807417
Modern Language Association 9th editionMAPPES, T., S. ACHENBACH, und J. MOHR. X-ray lithography for devices with high aspect ratio polymer submicron structures. Nr. 5-8, Amsterdam: Elsevier Science, 2007., 2007, http://pascal-francis.inist.fr/vibad ndex.php?action=search&terms=18807417.
Mohr Siebeck - Recht (Deutsch - Österreich)Emerald - Harvard
MAPPES, T., ACHENBACH, S. und MOHR, J. (2007), „X-ray lithography for devices with high aspect ratio polymer submicron structures“, in , Bd. 84, Amsterdam: Elsevier Science, 2007., verfügbar unter: http://pascal-francis.inist.fr/vibad ndex.php?action=search&terms=18807417.