American Psychological Association 6th edition

CIANCI, E., COPPA, A., & FOGLIETTI, V. (2007, January 1). Young’s modulus and residual stress of DF PECVD silicon nitride for MEMS free-standing membranes. 84(5-8). Amsterdam: Elsevier Science, 2007. Retrieved from http://pascal-francis.inist.fr/vibad ndex.php?action=search&terms=18807431

ISO-690 (author-date, English)

CIANCI, E, COPPA, A and FOGLIETTI, V, 2007. Young’s modulus and residual stress of DF PECVD silicon nitride for MEMS free-standing membranes. In: [online]. Amsterdam: Elsevier Science, 2007. 1 January 2007. Available from: http://pascal-francis.inist.fr/vibad ndex.php?action=search&terms=18807431

Modern Language Association 9th edition

CIANCI, E., A. COPPA, and V. FOGLIETTI. Young’s modulus and residual stress of DF PECVD silicon nitride for MEMS free-standing membranes. no. 5-8, Amsterdam: Elsevier Science, 2007., 2007, http://pascal-francis.inist.fr/vibad ndex.php?action=search&terms=18807431.

Mohr Siebeck - Recht (Deutsch - Österreich)

Emerald - Harvard

CIANCI, E., COPPA, A. and FOGLIETTI, V. (2007), “Young’s modulus and residual stress of DF PECVD silicon nitride for MEMS free-standing membranes”, in , Vol. 84, Amsterdam: Elsevier Science, 2007., available at: http://pascal-francis.inist.fr/vibad ndex.php?action=search&terms=18807431.

Warning: These citations may not always be 100% accurate.