American Psychological Association 6th edition

SATO, S., TACHI, K., KAKUSHIMA, K., AHMET, P., TSUTSUI, K., SUGII, N., HATTORI, T., & IWAI, H. (2007, January 1). Thermal-stability improvement of La ON thin film formed using nitrogen radicals. 84(9-10). Amsterdam: Elsevier Science, 2007. Retrieved from http://pascal-francis.inist.fr/vibad ndex.php?action=search&terms=18853471

ISO-690 (author-date, English)

SATO, S, TACHI, K, KAKUSHIMA, K, AHMET, P, TSUTSUI, K, SUGII, N, HATTORI, T and IWAI, H, 2007. Thermal-stability improvement of La ON thin film formed using nitrogen radicals. In: [online]. Amsterdam: Elsevier Science, 2007. 1 January 2007. Available from: http://pascal-francis.inist.fr/vibad ndex.php?action=search&terms=18853471

Modern Language Association 9th edition

SATO, S., K. TACHI, K. KAKUSHIMA, P. AHMET, K. TSUTSUI, N. SUGII, T. HATTORI, and H. IWAI. Thermal-stability improvement of La ON thin film formed using nitrogen radicals. no. 9-10, Amsterdam: Elsevier Science, 2007., 2007, http://pascal-francis.inist.fr/vibad ndex.php?action=search&terms=18853471.

Mohr Siebeck - Recht (Deutsch - Österreich)

Emerald - Harvard

SATO, S., TACHI, K., KAKUSHIMA, K., AHMET, P., TSUTSUI, K., SUGII, N., HATTORI, T. and IWAI, H. (2007), “Thermal-stability improvement of La ON thin film formed using nitrogen radicals”, in , Vol. 84, Amsterdam: Elsevier Science, 2007., available at: http://pascal-francis.inist.fr/vibad ndex.php?action=search&terms=18853471.

Warning: These citations may not always be 100% accurate.