FUJIYOSHI, K., SAWAI, K., INOUE, K., SAIKI, K., & SAKURAI, K. (2007, January 1). Voltage contrast for gate-leak failures detected by electron beam inspection. 20(3). New York, NY: Institute of Electrical and Electronics Engineers, 2007. Retrieved from http://pascal-francis.inist.fr/vibad ndex.php?action=search&terms=18990965
ISO-690 (author-date, English)FUJIYOSHI, Katsuhiro, SAWAI, Koetsu, INOUE, Kazutaka, SAIKI, Keiichi and SAKURAI, Koichi, 2007. Voltage contrast for gate-leak failures detected by electron beam inspection. In: [online]. New York, NY: Institute of Electrical and Electronics Engineers, 2007. 1 January 2007. Available from: http://pascal-francis.inist.fr/vibad ndex.php?action=search&terms=18990965
Modern Language Association 9th editionFUJIYOSHI, K., K. SAWAI, K. INOUE, K. SAIKI, and K. SAKURAI. Voltage contrast for gate-leak failures detected by electron beam inspection. no. 3, New York, NY: Institute of Electrical and Electronics Engineers, 2007., 2007, http://pascal-francis.inist.fr/vibad ndex.php?action=search&terms=18990965.
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FUJIYOSHI, K., SAWAI, K., INOUE, K., SAIKI, K. and SAKURAI, K. (2007), “Voltage contrast for gate-leak failures detected by electron beam inspection”, in , Vol. 20, New York, NY: Institute of Electrical and Electronics Engineers, 2007., available at: http://pascal-francis.inist.fr/vibad ndex.php?action=search&terms=18990965.