HARADA, Y., YAMAGUCHI, H., TAKAHASHI, T., IRIUDA, H., OBA, T., & YOSHIZAWA, M. (2007, January 1). Thickness dependence of ti buffer layers for fabricating As-grown Mg B2 films. 17(2). New York, NY: Institute of Electrical and Electronics Engineers, 2007. Retrieved from http://pascal-francis.inist.fr/vibad ndex.php?action=search&terms=19016902
ISO-690 (author-date, English)HARADA, Yoshitomo, YAMAGUCHI, Hirotaka, TAKAHASHI, Terukazu, IRIUDA, Hiroki, OBA, Tatsunori and YOSHIZAWA, Masahito, 2007. Thickness dependence of ti buffer layers for fabricating As-grown Mg B2 films. In: [online]. New York, NY: Institute of Electrical and Electronics Engineers, 2007. 1 January 2007. Available from: http://pascal-francis.inist.fr/vibad ndex.php?action=search&terms=19016902
Modern Language Association 9th editionHARADA, Y., H. YAMAGUCHI, T. TAKAHASHI, H. IRIUDA, T. OBA, and M. YOSHIZAWA. Thickness dependence of ti buffer layers for fabricating As-grown Mg B2 films. no. 2, New York, NY: Institute of Electrical and Electronics Engineers, 2007., 2007, http://pascal-francis.inist.fr/vibad ndex.php?action=search&terms=19016902.
Mohr Siebeck - Recht (Deutsch - Österreich)Emerald - Harvard
HARADA, Y., YAMAGUCHI, H., TAKAHASHI, T., IRIUDA, H., OBA, T. and YOSHIZAWA, M. (2007), “Thickness dependence of ti buffer layers for fabricating As-grown Mg B2 films”, in , Vol. 17, New York, NY: Institute of Electrical and Electronics Engineers, 2007., available at: http://pascal-francis.inist.fr/vibad ndex.php?action=search&terms=19016902.